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Solar-induced chemical vapor deposition of diamond-type carbon films [electronic resource].

Published
Kansas City, Mo. : Midwest Research Institute (Kansas City, Mo.), 1994.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Additional Creators
Midwest Research Institute (Kansas City, Mo.) and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
An improved chemical vapor deposition method for depositing transparent continuous coatings of sp.sup.3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H.sub.2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm.sup.2 through said reactant mixture to produce substrate temperatures of about 750.degree. C. to about 950.degree. C. to activate deposition of the film on said substrate.
Report Numbers
E 1.99:us 5346729
us 5346729
Other Subject(s)
Note
Published through SciTech Connect.
01/01/1994.
"us 5346729"
Tracy, C. Edwin; Pitts, J. Roland; King, David E.; Stanley, James T.
Funding Information
AC02-83CH10093
View MARC record | catkey: 13803370