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Correlation of UV damage threshold with post-annealing in CVD-grown SiO2 overlayers on etched fused silica substrates [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2012.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
PDF-file: 15 pages; size: 0.7 Mbytes
Additional Creators
Lawrence Berkeley National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
Abstract not provided
Report Numbers
E 1.99:llnl-proc-595853
llnl-proc-595853
Subject(s)
Note
Published through SciTech Connect.
10/17/2012.
"llnl-proc-595853"
Presented at: SPIE Laser Damage, Boulder, CO, United States, Sep 23 - Sep 26, 2012.
Matthews, M; Laurence, T; Miller, P; Nelson, A; Elhadj, S; Hamilton, J; Shen, N.
Funding Information
W-7405-ENG-48
View MARC record | catkey: 13820312