Alkaline etch system qualification [electronic resource].
- Published:
- Washington, D.C. : United States. Dept. of Energy, 1997.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy. - Physical Description:
- 21 pages : digital, PDF file
- Additional Creators:
- United States. Department of Energy
United States. Department of Energy. Office of Scientific and Technical Information - Access Online:
- www.osti.gov
- Summary:
- Based on the data from this qualification activity, the Atotech etch system, even with minimum characterization, was capable of etching production printed circuit products as good as those from the Chemcut system. Further characterization of the Atotech system will improve its etching capability. In addition to the improved etch quality expected from further characterization, the Atotech etch system has additional features that help reduce waste and provide for better consistency in the etching process. The programmable logic controller and computer will allow operators to operate the system manually or from pre-established recipes. The evidence and capabilities of the Atotech system made it as good as or better than the Chemcut system for etching WR products. The Printed Wiring Board Engineering Department recommended that the Atotech system be released for production. In December 1995, the Atotech system was formerly qualified for production.
- Subject(s):
- Note:
- Published through SciTech Connect.
04/01/1997.
"kcp--613-5917"
"DE97052933"
Tucker, D.R.; Pemberton, S.E.; Goldammer, S.E.
Allied-Signal Aerospace Co., Kansas City, MO (United States). Kansas City Div. - Funding Information:
- AC04-76DP00613
View MARC record | catkey: 14075395