Actions for Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool [electronic resource].

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Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 1995.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
13 pages : digital, PDF file
Additional Creators
Sandia National Laboratories, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.
Report Numbers
E 1.99:sand--95-1243c
E 1.99: conf-951214--1
conf-951214--1
sand--95-1243c
Subject(s)
Other Subject(s)
Note
Published through SciTech Connect.
12/01/1995.
"sand--95-1243c"
" conf-951214--1"
"DE96002701"
3. international symposium on magnetic suspension technology, Tallahassee, FL (United States), 13-15 Dec 1995.
Smith, T.G.; Wronosky, J.B.; Darnold, J.R.
Funding Information
AC04-94AL85000
View MARC record | catkey: 14077071