The DOE2000 materials microcharacterization collaboratory [electronic resource].
- Washington, D.C. : United States. Dept. of Energy, 1998.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- 5 pages : digital, PDF file
- Additional Creators:
- Argonne National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
- Restrictions on Access:
- Free-to-read Unrestricted online access
- The Materials Microcharacterization Collaborator (MMC) was created last year as a pilot project within the US Department of Energy's DOE2000 program . The DOE2000 program has, as its main goals, to develop improved capabilities for solving DOE's complex scientific problems, to increase DOE's R and D productivity and efficiency, and to enhance the access of R and D partners to DOE resources. One of the strategies to meet these goals is the establishment of national collaboratories to provide access via the Internet to unique or expensive DOE research facilities and to expertise for remote collaboration, experimentation, production, software development, modeling, and measurement. In addition, collaboratories will benefit researchers by providing tools for video conferencing, shared data-viewing, and collaborative analysis. Cooperative pilots projects, jointly funded by DOE2000 and a scientific program area, are expected to lead to significant scientific achievements by developing new capabilities and increasing the efficiency of doing the work (e.g., by reducing travel, increasing communication, and promoting the sharing of data among formerly disparate research groups). The MMC project unites four DOE BES electron microscopy user centers located at ANL, LBNL, ORNL and the University of Illinois with the DOE EE center located at ORNL. Also included in the MMC project is the NAMT program of NIST. To ensure that technology benefits are not restricted merely to electron-beam microcharacterization, the MMC also includes neutron and x-ray beam lines at ORNL and BNL. Industrial partners are Gatan Inc., R.J. Lee Group, EMiSPEC Systems Inc., Philips Electronic Instruments, Hitachi Instruments, Inc., JEOL-USA, SUN MicroSystems, and Graham Technology Solutions. The MMC will link these organizations, all leaders in their respective fields, into a single on-line interactive Materials Microcharacterization Collaborator to increase the utilization of their extensive capabilities while decreasing the time constant associated with multidisciplinary materials research.
- Report Numbers:
- E 1.99:anl/msd/cp-96246
- Other Subject(s):
- Published through SciTech Connect.
14th International Congress on Electron Microscopy, Cancun (MX), 08/31/1998--09/04/1998.
- Funding Information:
View MARC record | catkey: 14090446