Application of ion implantation to electrochemical studies [electronic resource].
- Washington, D.C : United States. Dept. of Energy. Office of Energy Research, 1990.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- Pages: (13 pages) : digital, PDF file
- Additional Creators:
- Oak Ridge National Laboratory
United States. Department of Energy. Office of Energy Research
United States. Department of Energy. Office of Scientific and Technical Information
- The application of ion implantation to electrochemical studies is illustrated with a study of electrocatalysis of the chlorine evolution reaction at RuO₂, IrO₂, TiO₂ mixed oxide anodes in chloride solutions. Electrode/solution interfaces of well defined catalyst composition are generated in a reproducible manner by implantation of Ru (or Ir) into Ti followed by in situ oxidation of the near surface titanium alloys. Ion implantation enables the tailoring on an atomic scale of an electrochemical interface. Analysis by Rutherford backscattering adds the ability of quantitative mechanistic study in terms of actual ion concentration at the interface. In addition, ion implantation, as a processing technique, creates new materials with improved properties which may have future practical use in catalytic materials.
- Published through SciTech Connect.
7. international conference on ion beam modification of materials, Knoxville, TN (USA), 9-14 Sep 1990.
White, C.W.; Vallet, C.E.
- Funding Information:
View MARC record | catkey: 14101149