Precision Tiltmeter as a Reference for Slope MeasuringInstruments [electronic resource].

Published:: Washington, D.C. : United States. Dept. of Energy, 2007.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Additional Creators:: United States. Department of Energy and United States. Department of Energy. Office of Scientific and Technical Information

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Summary:

The next generation of synchrotrons and free electron lasers require extremely high-performance x-ray optical systems for proper focusing. The necessary optics cannot be fabricated without the use of precise optical metrology instrumentation. In particular, the Long Trace Profiler (LTP) based on the pencil-beam interferometer is a valuable tool for low-spatial-frequency slope measurement with x-ray optics. The limitations of such a device are set by the amount of systematic errors and noise. A significant improvement of LTP performance was the addition of an optical reference channel, which allowed to partially account for systematic errors associated with wiggling and wobbling of the LTP carriage. However, the optical reference is affected by changing optical path length, non-homogeneous optics, and air turbulence. In the present work, we experimentally investigate the questions related to the use of a precision tiltmeter as a reference channel. Dependence of the tiltmeter performance on horizontal acceleration, temperature drift, motion regime, and kinematical scheme of the translation stage has been investigated. It is shown that at an appropriate experimental arrangement, the tiltmeter provides a slope reference for the LTP system with accuracy on the level of 0.1 {micro}rad (rms).

Report Numbers:

E 1.99:lbnl--62491
lbnl--62491

Other Subject(s):

Note:

Published through SciTech Connect.
08/01/2007.
"lbnl--62491"
": KC0204016"
SPIE Optics and Photonics 2007: Advances inMetrology for X-Ray and EUV Optics II, San Diego, CA, USA, 26-30 August2007.
Smith, Brian V.; Yashchuk, Valeriy V.; Domning, Edward E.; Morrison, Gregory Y.; Kirschman, Jonathan L.
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Advanced Light Source(ALS)

Funding Information:

DE-AC02-05CH11231
458117

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