Actions for Pulsewidth-dependent damage measurements of dielectric materials [electronic resource].

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Pulsewidth-dependent damage measurements of dielectric materials [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 1994.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
5 pages : digital, PDF file
Additional Creators
Lawrence Livermore National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
The application of chirped pulse amplification to short-pulse lasers has led to a dramatic increase in the number of high-power, sub-picosecond laser systems. Accordingly, knowledge of the short-pulse damage thresholds of optical components and the scaling of the damage thresholds with pulsewidth has become increasingly important. The development of high energy, (e.g, kilojoule class) short-pulse lasers is contingent on the ability to produce optical components capable of withstanding high fluence nanosecond and femtosecond pulses. In this paper, the authors report on their measurements of the front-surface damage threshold of many different dielectric materials including widows, multilayer mirrors, and diffraction gratings over the pulsewidth range of 0.1 to 3,000 ps.
Report Numbers
E 1.99:ucrl-jc--118115
E 1.99: conf-940889--3
conf-940889--3
ucrl-jc--118115
Subject(s)
Other Subject(s)
Note
Published through SciTech Connect.
06/01/1994.
"ucrl-jc--118115"
" conf-940889--3"
"DE94018594"
Topical meeting on high field interactions and short wavelength generation,Saint Malo (France),22-24 Aug 1994.
Shore, B.W.; Stuart, B.C.; Herman, S.; Perry, M.D.
Funding Information
W-7405-ENG-48
View MARC record | catkey: 14108995