Development of solid state moisture sensors for semiconductor fabrication applications [electronic resource].

Published: Washington, D.C. : United States. Dept. of Energy, 1994.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description: 12 pages : digital, PDF file
Additional Creators: Sandia National Laboratories, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information

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Summary

We describe the design and fabrication of two types of solid state moisture sensors, and discuss the results of an evaluation of the sensors for the detection of trace levels of moisture in semiconductor process gases. The first sensor is based on surface acoustic wave (SAW) technology. A moisture sensitive layer is deposited onto a SAW device, and the amount of moisture adsorbed on the layer produces a proportional shift in the operating frequency of the device. Sensors based on this concept have excellent detection limits for moisture in inert gas (100 ppb) and corrosive gas (150 ppb in HCl). The second sensor is a simple capacitor structure that uses porous silicon as a moisture-sensitive dielectric material. The detection limits of these sensors for moisture in inert gas are about 700 ppb prior to HCl exposure, and about 7 ppm following HCl exposure.

Report Numbers

E 1.99:sand--94-1533c
E 1.99: conf-9410161--1
conf-9410161--1
sand--94-1533c

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Note

Published through SciTech Connect.
08/01/1994.
"sand--94-1533c"
" conf-9410161--1"
"DE94015771"
"GB0103012"
SEMATECH: symposium on contamination free manufacturing,San Jose, CA (United States),4-6 Oct 1994.
Peterson, D.W.; Kelly, M.J.; Pfeifer, K.B.; Tuck, M.R.; Sweet, J.N.; Guilinger, T.R.

Funding Information

AC04-94AL85000

View MARC record | catkey: 14112330