Characterization of SAL605 negative resist at {lambda}=13 nm [electronic resource].
- Published:
- Washington, D.C. : United States. Dept. of Energy, 1996. and Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- 5 pages : digital, PDF file
- Additional Creators:
- Lawrence Livermore National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
- Access Online:
- www.osti.gov
- Summary:
- We have characterized the response of the negative resist SAL605 in the extreme ultraviolet (λ=13 nm). The sensitivity was found to be ≈1 mJ/cm³ for all conditions studied. We have identified processing conditions leading to high (γ<4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.
- Subject(s):
- Note:
- Published through SciTech Connect., 05/24/1996., "ucrl-jc--123012", " conf-960493--14", "DE96012224", Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996., and Ciarlo, D.; Kania, D.R.; Gaines, D.P.; La Fontaine, B.
- Funding Information:
- W-7405-ENG-48
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