Development of polishing methods for Chemical Vapor Deposited Silicon Carbide mirrors for synchrotron radiation [electronic resource].
- Livermore, Calif : Lawrence Livermore National Laboratory, 1987.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- Pages: 21 : digital, PDF file
- Additional Creators:
- Lawrence Livermore National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
- Restrictions on Access:
- Free-to-read Unrestricted online access
- Material properties of Chemical Vapor Deposited Silicon Carbide (CVD SiC) make it ideal for use in mirrors for synchrotron radiation experiments. We developed methods to grind and polish flat samples of CVD SiC down to measured surface roughness values as low as 1.1 Angstroms rms. We describe the processing details, including observations we made during trial runs with alternative processing recipes. We conclude that pitch polishing using progressively finer diamond abrasive, augmented with specific water based lubricants and additives, produces superior results. Using methods based on these results, a cylindrical and a toroidal mirror, each about 100 x 300mm, were respectively finished by Continental Optical and Frank Cooke, Incorporated. WYCO Interferometry shows these mirrors have surface roughness less than 5.7 Angstroms rms. These mirrors have been installed on the LLNL/UC X-ray Calibration and Standards Facility at the Stanford Synthrotron Radiation Laboratory.
- Report Numbers:
- E 1.99:ucrl-95882
E 1.99: conf-8610113-2
- Other Subject(s):
- Published through SciTech Connect.
Workshop on optical fabrication and testing, Seattle, WA, USA, 21 Oct 1986.
Brown, N.J.; Fuchs, B.A.
- Funding Information:
View MARC record | catkey: 14115839