Actions for Roles of Oxygen and Water Vapor in the Oxidation of Halogen Terminated Ge(111) Surfaces [electronic resource].

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Roles of Oxygen and Water Vapor in the Oxidation of Halogen Terminated Ge(111) Surfaces [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2006.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
3 pages : digital, PDF file
Additional Creators
Stanford Linear Accelerator Center, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
The initial stage of the oxidation of Cl and Br terminated Ge(111) surfaces is studied using photoelectron spectroscopy. The authors perform controlled experiments to differentiate the effects of different factors in oxidation, and find that water vapor and oxygen play different roles. Water vapor effectively replaces the halogen termination layers with the hydroxyl group, but does not oxidize the surfaces further. In contrast, little oxidation is observed for Cl and Br terminated surfaces with dry oxygen alone. However, with the help of water vapor, oxygen oxidizes the surface by breaking the Ge-Ge back bonds instead of changing the termination layer.
Report Numbers
E 1.99:slac-pub-12263
slac-pub-12263
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Note
Published through SciTech Connect.
12/18/2006.
"slac-pub-12263"
Applied Physics Letters FT
Lee, Dong-Ick; Sun, Yun; Liu, Zhi; Sun, Shiyu; Pianette, Piero.
Funding Information
AC02-76SF00515
View MARC record | catkey: 14393076