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Accelerating EUV learning with synchrotron light [electronic resource] : Mask roughness challenges ahead

Published
Berkeley, Calif. : Lawrence Berkeley National Laboratory, 2011.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
8 : digital, PDF file
Additional Creators
Lawrence Berkeley National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
No abstract prepared.
Report Numbers
E 1.99:lbnl-5113e
lbnl-5113e
Subject(s)
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Note
Published through SciTech Connect.
09/01/2011.
"lbnl-5113e"
2011 International Symposium on Extreme Ultraviolet Lithography , Miami, FL, October 17-21, 2011.
Goldberg, Kenneth A.; Mochi, Iacopo; Naulleau, Patrick; Gullikson, Eric; McClinton, Brittany; Rastegar, Abbas.
Materials Sciences Division
Funding Information
DE-AC02-05CH11231
View MARC record | catkey: 14443862