Actions for Collecting EUV mask images through focus by wavelength tuning [electronic resource].

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Collecting EUV mask images through focus by wavelength tuning [electronic resource].

Published
Berkeley, Calif. : Lawrence Berkeley National Laboratory, 2009.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
8 : digital, PDF file
Additional Creators
Lawrence Berkeley National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we demonstrate the method and discuss the relative advantages that this data collection technique affords.
Report Numbers
E 1.99:lbnl-1622e
lbnl-1622e
Other Subject(s)
Note
Published through SciTech Connect.
02/23/2009.
"lbnl-1622e"
SPIE advanced lithography 2009, San Jose, CA, February 22-27, 2009.
Goldberg, Kenneth A.; Mochi, Iacopo; Huh, Sungmin.
Materials Sciences Division
Funding Information
DE-AC02-05CH11231
View MARC record | catkey: 14444042