Depth-resolved soft x-ray photoelectron emission microscopy in nanostructures via standing-wave excited photoemission [electronic resource].
- Berkeley, Calif. : Lawrence Berkeley National Laboratory, 2008.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- 13 : digital, PDF file
- Additional Creators:
- Lawrence Berkeley National Laboratory
United States. Department of Energy. Office of Scientific and Technical Information
- We present an extension of conventional laterally resolved soft x-ray photoelectron emission microscopy. A depth resolution along the surface normal down to a few Å can be achieved by setting up standing x-ray wave fields in a multilayer substrate. The sample is an Ag/Co/Au trilayer, whose first layer has a wedge profile, grown on a Si/MoSi2 multilayer mirror. Tuning the incident x-ray to the mirror Bragg angle we set up standing x-ray wave fields. We demonstrate the resulting depth resolution by imaging the standing wave fields as they move through the trilayer wedge structure.
- Published through SciTech Connect.
Physical Review Letters ISSN 0031-9007; PRLTAO FT
Schreiber, R.; Fischer, P.; Fadley, C.S.; Yang, S.-H.; Schneider, C.M.; Locatelli, A.; Eberhardt, W.; Kaiser, A.; Salmassi, F.; Durr, H.A.; Wiemann, C.; Kronast, F.; Ovsyannikov, R.; Burgler, D.E.
Materials Sciences Division
- Funding Information:
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