An Evaluation of Atmospheric-pressure Plasma for the Cost-Effective Deposition of Antireflection Coatings [electronic resource].
- Washington, D.C : United States. Dept. of Energy. Office of Energy Efficiency and Renewable Energy, 2010. and Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Additional Creators:
- North Dakota State University, United States. Department of Energy. Office of Energy Efficiency and Renewable Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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- Free-to-read Unrestricted online access
- Atmospheric-pressure plasma deposition (APPD) has previously been used to deposit various functional materials including polymeric surface modification layers, transparent conducting oxides, and photo catalytic materials. For many plasma polymerized coatings, reaction occurs via free radical mechanism where the high energy electrons from the plasma activate the olefinic carbon-carbon double bonds - a typical functional group in such precursors. The precursors for such systems are typically inexpensive and readily available and have been used in vacuum PECVD previously. The objectives are to investigate: (1) the effect of plasma power, gas composition and substrate temperature on the Si-based film properties using triethylsilane(TES) as the precursor; and (2) the chemical, mechanical, and optical properties of several experimental matrices based on Design of Experiment (DOE) principals. A simple APPD route has been utilized to deposit Si based films from an inexpensive precursor - Triethylsilane (TES). Preliminary results indicates formation of Si-C & Si-O and Si-O, Si-C & Si-N bonds with oxygen and nitrogen plasmas respectively. N₂-O₂ plasma showed mixed trend; however oxygen remains a significant portion of all films, despite attempts to minimize exposure to atmosphere. SiN, SiC, and SiO ratios can be modified by the reaction conditions resulting in differing film properties. SE studies revealed that films with SiN bond possess refractive index higher than coatings with Si-O/Si-C bonds. Variable angle reflectance studies showed that SiOCN coatings offer AR properties; however thickness and refractive index optimization of these coatings remains necessary for application as potential AR coatings.
- Published through SciTech Connect., 04/01/2010., "doe/go88160-14", Spring 2010 MRS Conference; San Francisco, CA; April 5-9, 2010., and Douglas L. Schulz; Kyle W. Johnson; Rob Sailer; Guruvenket Srinivasan.
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