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Wet-Etch Figuring Optical Figuring by Controlled Application of Liquid Etchant [electronic resource].

Published:
Washington, D.C. : United States. Dept. of Energy, 2001.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description:
17p : digital, PDF file
Additional Creators:
Lawrence Berkeley National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary:
WET-ETCH FIGURING (WEF) is an automated method of precisely figuring optical materials by the controlled application of aqueous etchant solution. This technology uses surface-tension-gradient-driven flow to confine and stabilize a wetted zone of an etchant solution or other aqueous processing fluid on the surface of an object. This wetted zone can be translated on the surface in a computer-controlled fashion for precise spatial control of the surface reactions occurring (e.g. chemical etching). WEF is particularly suitable for figuring very thin optical materials because it applies no thermal or mechanical stress to the material. Also, because the process is stress-free the workpiece can be monitored during figuring using interferometric metrology, and the measurements obtained can be used to control the figuring process in real-time--something that cannot be done with traditional figuring methods.
Report Numbers:
E 1.99:ucrl-id-142529
ucrl-id-142529
Subject(s):
Other Subject(s):
Note:
Published through SciTech Connect.
02/13/2001.
"ucrl-id-142529"
Britten, J.
Funding Information:
W-7405-ENG-48
View MARC record | catkey: 14447106