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A laboratory based system for Laue micro x-ray diffraction [electronic resource].

Published
Berkeley, Calif. : Lawrence Berkeley National Laboratory. Advanced Light Source, 2007.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Additional Creators
Lawrence Berkeley National Laboratory, Lawrence Berkeley National Laboratory. Advanced Light Source, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A laboratory diffraction system capable of illuminating individual grains in a polycrystalline matrix is described. Using a microfocus x-ray source equipped with a tungsten anode and prefigured monocapillary optic, a micro-x-ray diffraction system with a 10 mum beam was developed. The beam profile generated by the ellipsoidal capillary was determined using the"knife edge" approach. Measurement of the capillary performance, indicated a beam divergence of 14 mrad and a useable energy bandpass from 5.5 to 19 keV. Utilizing the polychromatic nature of the incident x-ray beam and application of the Laue indexing software package X-Ray Micro-Diffraction Analysis Software, the orientation and deviatoric strain of single grains in a polycrystalline material can be studied. To highlight the system potential the grain orientation and strain distribution of individual grains in a polycrystalline magnesium alloy (Mg 0.2 wt percent Nd) was mapped before and after tensile loading. A basal (0002) orientation was identified in the as-rolled annealed alloy; after tensile loading some grains were observed to undergo an orientation change of 30 degrees with respect to (0002). The applied uniaxial load was measured as an increase in the deviatoric tensile strain parallel to the load axis (37 References).
Report Numbers
E 1.99:lbnl-789e
lbnl-789e
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Note
Published through SciTech Connect.
02/28/2007.
"lbnl-789e"
Review of Scientific Instruments 78 2 0034-6748 FT
Stevenson, A.W.; Parry, D.; Tamura, N.; Wilkins, S.; Lynch, P.A.; Liang, D.; Tamura, Nobumichi; Advanced Light Source.
Funding Information
DE-AC02-05CH11231
View MARC record | catkey: 14448482