Actions for Fabrication of Photonic band gap Materials [electronic resource].

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Fabrication of Photonic band gap Materials [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2000.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
vp : digital, PDF file
Additional Creators
Ames Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microsphere, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microsphere there from. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microsphere may be polystyrenemicrosphere.
Report Numbers
E 1.99:patents-us--a9477191
E 1.99: us patents application 9-477,191
us patents application 9-477,191
patents-us--a9477191
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Note
Published through SciTech Connect.
01/05/2000.
"patents-us--a9477191"
" us patents application 9-477,191"
"US patent application 9-477,191"
Ho, Kai-Ming; Biswas, Rana; Constant, Kristen; Subramania, Ganapathi S.
Funding Information
W-7405-ENG-82
View MARC record | catkey: 14449178