PIT INITIATION IN AlO{sub X}/Al THIN FILMS [electronic resource].

Published: Washington, D.C. : United States. Dept. of Energy. Office of Energy Research, 1998.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description: 5 pages : digital, PDF file
Additional Creators: Brookhaven National Laboratory, United States. Department of Energy. Office of Energy Research, and United States. Department of Energy. Office of Scientific and Technical Information

Access Online

www.osti.gov

Availability

Finding items...

Restrictions on Access

Free-to-read Unrestricted online access

Summary

The electrochemical responses of AlOₓ/Al thin films have been investigated as a function of film growth conditions which produce films with different grain orientation, size and morphology. Films with smooth, 150 nm diameter, randomly oriented grains show a higher pitting potential and lower passive current than those films with large grain-boundary grooving from a mixture of smooth micron-sized, (200)-oriented grains and 300--500 nm diameter, (220)-oriented grains. These results suggest that surface roughness from grain-boundary grooving affects the pitting resistance more strongly than does the grain boundary density.

Report Numbers

E 1.99:bnl--66100
E 1.99: kc020102
kc020102
bnl--66100

Subject(s)

Materials Science

Other Subject(s)

Note

Published through SciTech Connect.
11/01/1998.
"bnl--66100"
" kc020102"
"KC020102"
CRITICAL FACTORS IN LOCALIZED CORROSION III, 194TH ELECTROCHEMICAL SOCIETY MEETING, BOSTON, MA (US), 11/01/1998--11/06/1998.
WALL,F.D.; BARBOUR,J.C.; MARTINEZ,M.A.; ISAACS,H.S.; BUCHHEIT,R.G.; COPELAND,R.G.; MISSERT,N.; SON,K.A.; MINOR,K.G.

Funding Information

AC02-98CH10886
AS010MSD

View MARC record | catkey: 14449951