Actions for Study of the effects of polishing, etching, cleaving, and water leaching on the UV laser damage of fused silica [electronic resource].

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Study of the effects of polishing, etching, cleaving, and water leaching on the UV laser damage of fused silica [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 1997.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
12 pages : digital, PDF file
Additional Creators
Lawrence Livermore National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A damage morphology study was performed with a 355 nm Nd:YAG laser on synthetic UV-grade fused silica to determine the effects of post- polish chemical etching on laser-induced damage, compare damage morphologies of cleaved and polished surfaces, and understand the effects of the hydrolyzed surface layer and waste-crack interactions. The samples were polished , then chemically etched in buffered HF solution to remove 45,90,135, and 180 nm of surface material. Another set of samples was cleaved and soaked in boiling distilled water for 1 second and 1 hour. All the samples were irradiated at damaging fluencies and characterized by Normarski optical microscopy and scanning electron microscopy. Damage was initiated as micro-pits on both input and output surfaces of the polished fused silica sample. At higher fluencies, the micro-pits generated cracks on the surface. Laser damage of the polished surface showed significant trace contamination levels within a 50 nm surface layer. Micro-pit formation also appeared after irradiating cleaved fused silica surfaces at damaging fluences. Linear damage tracks corresponding cleaving tracks were often observed on cleaved surfaces. Soaking cleaved samples in water produced wide laser damage tracks.
Report Numbers
E 1.99:ucrl-jc--129275
E 1.99: conf-9710116--
conf-9710116--
ucrl-jc--129275
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Other Subject(s)
Note
Published through SciTech Connect.
12/23/1997.
"ucrl-jc--129275"
" conf-9710116--"
"DE98052069"
"DP0212000"
": W-7405-Eng-48"
29. annual Boulder damage symposium on optical materials for high power lasers, Boulder, CO (United States), 6-8 Oct 1997.
Thomas, I.; Camp, D.W.; Hutcheon, I.D.; Kozlowski, M.R.; Salleo, A.; Genin, F.Y.; Sheehan, L.M.; Yoshiyama, J.
Funding Information
W-7405-ENG-48
View MARC record | catkey: 14450443