At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic [electronic resource].

Published:: Washington, D.C. : United States. Dept. of Energy, 2001.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description:: 18 pages : digital, PDF file
Additional Creators:: Lawrence Berkeley National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information

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Summary:

At-wavelength interferometric characterization of a new 4x-reduction lithographic-quality extreme ultraviolet (EUV) optical system is described. This state-of-the-art projection optic was fabricated for installation in the EUV lithography Engineering Test Stand (ETS) and is referred to as the ETS Set-2 optic. EUV characterization of the Set-2 optic is performed using the EUV phase-shifting point diffraction interferometer (PS/PDI) installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. This is the same interferometer previously used for the at-wavelength characterization and alignment of the ETS Set-1 optic. In addition to the PS/PDI-based full-field wavefront characterization, we also present wavefront measurements performed with lateral shearing interferometry, the chromatic dependence of the wavefront error, and the system-level pupil-dependent spectral-bandpass characteristics of the optic; the latter two properties are only measurable using at-wavelength interferometry.

Report Numbers:

E 1.99:lbnl--49064
lbnl--49064

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Note:

Published through SciTech Connect.
06/10/2001.
"lbnl--49064"
IPBN 2001, Washington, DC (US), 05/29/2001--06/01/2001.
Goldberg, Kenneth A.; Naulleau, Patrick; Batson, Phillip; Denham, Paul E.; Bokor, Jeffrey; Gullikson, Eric M.; Anderson, Erik H.; Jackson, Keith H.; Rekawa, Senajith.

Funding Information:

AC03-76SF00098
833605

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