An X-ray photoelectron spectroscopic study of the B-N-Ti system [electronic resource].

Published:: Washington, D.C. : United States. Dept. of Energy. Office of Energy Research, 1997.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description:: 9 pages : digital, PDF file
Additional Creators:: Lawrence Berkeley National Laboratory, United States. Department of Energy. Office of Energy Research, and United States. Department of Energy. Office of Scientific and Technical Information

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Summary:

Composite nitrides (such as BN, TiN) are widely used in various industrial applications because of their extreme wear and corrosion resistance, thermal and electrical properties. In order to obtain composite materials with these optimal properties, it is important to elucidate whether any chemical reactions occur at nitride/metal interfaces, e.g., those involving BN-Ti/TiN. Materials of interest include the deposition by PVD of Ti and TiN on BN substrates. Some of these systems were then subjected to varying degrees of physical and thermal alteration. Detailed X-ray photoelectron spectroscopy (XPS) has therefore been rendered of these interfaces using cross-sectional display and sputter etching. Resulting structural and morphological features have been investigated with transmission electron microscopy (TEM) and X-ray diffraction (XRD). Diffusion of the nitridation, oxynitride formation and interfacial growth are of general interest.

Report Numbers:

E 1.99:lbnl--40396
E 1.99: lsbl--384
E 1.99:conf-970302--19
conf-970302--19
lsbl--384
lbnl--40396

Subject(s):

Materials Science

Other Subject(s):

Note:

Published through SciTech Connect.
03/01/1997.
"lbnl--40396"
" lsbl--384"
"conf-970302--19"
"DE97007896"
Spring meeting of the Materials Research Society, San Francisco, CA (United States), 31 Mar - 4 Apr 1997.
Benko, E.; Seal, S.; Morgiel, J.; Barr, T.L.; Sobczak, N.

Funding Information:

AC03-76SF00098

View MARC record | catkey: 14452564