Actions for Influence of solution chemistry on dissolution of artificial passive films [electronic resource].

Email RIS file
Bookmark
Report an Issue

Influence of solution chemistry on dissolution of artificial passive films [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy. Office of Energy Research, 1997.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
13 pages : digital, PDF file
Additional Creators
Brookhaven National Laboratory, United States. Department of Energy. Office of Energy Research, and United States. Department of Energy. Office of Scientific and Technical Information
Access Online

Availability

I Want It
I Want It

Finding items...

Restrictions on Access
Free-to-read Unrestricted online access
Summary
The dissolution behavior of artificial Fe, Cr, and Fe/Cr passive films (sputter-deposited Fe/Cr oxide films on inert substrates) was studied by in situ X-ray absorption near edge spectroscopy (XANES). Low pH and presence of halides (Cl{sup −} and F{sup −}) accelerate the dissolution due to the solubility of Fe oxides in these solutions. The presence of Fe(2+) in the oxide film strongly accelerates dissolution in acidic solution. For mixed Fe/Cr oxides, F{sup −} leads to a selective dissolution of Fe oxide. Cr₂O₃ is not attacked by fluoride; hence if mixed oxide films contain a sufficient amount of Cr oxide, dissolution stop is obtained, probably by surface enrichment of Cr oxide. The composition of the oxide film is also crucial for its electrochemical stability. An increased Cr₂O₃ content increases the resistance against reductive dissolution, increases the resistance in aggressive solutions (low pH, halides), but decreases the resistance against oxidative dissolution.
Report Numbers
E 1.99:bnl--64152
E 1.99: conf-970805--
conf-970805--
bnl--64152
Subject(s)
Other Subject(s)
Note
Published through SciTech Connect.
10/01/1997.
"bnl--64152"
" conf-970805--"
"DE98000297"
192. meeting of the Electrochemical Society and 48. annual meeting of the International Society of Electrochemistry, Paris (France), 31 Aug - 5 Sep 1997.
Ryan, M.P.; Isaacs, H.S.; Virtanen, S.; Boehni, H.; Schmuki, P.; Oblonsky, L.J.; Vippola, M.
Funding Information
AC02-76CH00016
View MARC record | catkey: 14454037