Actions for Dependence of the Characteristics of Mo Films on Sputter Conditions [electronic resource].

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Dependence of the Characteristics of Mo Films on Sputter Conditions [electronic resource].

Published
Washington, D.C. : United States. Dept. of Energy, 2000.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
pages 239-240 : digital, PDF file
Additional Creators
National Renewable Energy Laboratory (U.S.), United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
The residual stress, resistance, orientation, and microstructure of sputtered Mo films were studied as a function of varied-deposition power and pressure.
Report Numbers
E 1.99:909438
Subject(s)
Other Subject(s)
Note
Published through SciTech Connect.
01/01/2000.
Program and Proceedings: NCPV Program Review Meeting 2000, 16-19 April 2000, Denver, Colorado; NREL/BK-520-28064.
Noufi, R.; Hasoon, F.; Moutinho, H.; Al-Jassim, M. M.; Alleman, J. L.; Althani, H.
Funding Information
AC36-99-GO10337
View MARC record | catkey: 14454723