Export to Refworks Export to EndNote Email
Report an Issue

Plasma surface cleaning using microwave plasmas [electronic resource].

Published:
Washington, D.C. : United States. Dept. of Energy, 1993.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description:
15 pages : digital, PDF file
Additional Creators:
United States. Department of Energy and United States. Department of Energy. Office of Scientific and Technical Information
Access Online

Availability

I Want It

Finding items...

Restrictions on Access:
Free-to-read Unrestricted online access
Summary:
In a microwave electron cyclotron resonance (ECR) plasma source, reactive plasmas of oxygen and its mixture with argon are used for plasma-cleaning experiments. Aluminum test samples (0.95 × 1.9 cm) were coated with thin films (≤ 20 μm in thickness) of Shell Vitrea oil and cleaned by using such reactive plasmas. The plasma cleaning was done in various discharge conditions with fixed microwave power, rf power, biased potential, gas pressures (0.5 and 5 mtorr), and operating time up to 35 min. The status of plasma cleaning has been monitored by using mass spectroscopy. Mass loss of the samples after plasma cleaning was measured to estimate cleaning rates. Measured clean rates of low pressure (0.5 mtorr) argon/oxygen plasmas were as high as 2.7 μ/min. X-ray photoelectron spectroscopy was used to determine cleanliness of the sample surfaces and confirm the effectiveness of plasma cleaning in achieving atomic levels of surface cleanliness. In this paper, significant results are reported and discussed.
Report Numbers:
E 1.99:y/dv--1298
E 1.99: conf-9311110--1
conf-9311110--1
y/dv--1298
Subject(s):
Other Subject(s):
Note:
Published through SciTech Connect.
11/01/1993.
"y/dv--1298"
" conf-9311110--1"
"DE94002754"
Annual Vacuum Society science symposium,Triangle Park, NC (United States),15-19 Nov 1993.
Thompson, L.M.; Tsai, C.C.; Nelson, W.D.; Googin, J.M.; Glover, A.L.; Haselton, H.H.; Campbell, V.B.; Schechter, D.E.
Oak Ridge Y-12 Plant, TN (United States)
Funding Information:
AC05-84OS21400
View MARC record | catkey: 14456052