Initial operation of a large-scale Plasma Source Ion Implantation experiment [electronic resource].

Published: Washington, D.C. : United States. Dept. of Energy, 1993.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description: 20 pages : digital, PDF file
Additional Creators: Los Alamos National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information

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Summary

In Plasma Source Ion Implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions are accelerated toward the workpiece and implanted in its surface. Experimental PSII results reported in the literature have been for small workpieces. A large scale PSII experiment has recently been assembled at Los Alamos, in which stainless steel and aluminum workpieces with surface areas over 4 m² have been implanted in a 1.5 m-diameter, 4.6 m-length cylindrical vacuum chamber. Initial implants have been performed at 50 kV with 20 μs pulses of 53 A peak current, repeated at 500 Hz, although the pulse modulator will eventually supply 120 kV pulses of 60 A peak current at 2 kHz. A 1,000 W, 13.56 MHz capacitively-coupled source produces nitrogen plasma densities in the 10¹⁵ m{sup −3} range at neutral pressures as low as 0.02 mtorr. A variety of antenna configurations have been tried, with and without axial magnetic fields of up to 60 gauss. Measurements of sheath expansion, modulator voltage and current, and plasma density fill-in following a pulse are presented. The authors consider secondary electron emission, x-ray production, workpiece arcing, implant conformality, and workpiece and chamber heating.

Report Numbers

E 1.99:la-ur--93-3216
E 1.99: conf-9308156--2
conf-9308156--2
la-ur--93-3216

Subject(s)

Materials Science

Other Subject(s)

Note

Published through SciTech Connect.
10/01/1993.
"la-ur--93-3216"
" conf-9308156--2"
"DE94000805"
Workshop on plasma-based ion implantation,Madison, WI (United States),4-6 Aug 1993.
Wood, B.P.; Gribble, R.J.; Nastasi, M.A.; Henins, I.; Rej, D.J.; Reass, W.A.; Faehl, R.J.

Funding Information

W-7405-ENG-36

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