Optimization of laser scribing for thin-film PV modules. Annual technical progress report, 12 April 1995--11 April 1996 [electronic resource].
- Washington, D.C. : United States. Dept. of Energy, 1996.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- 21 pages : digital, PDF file
- Additional Creators:
- United States. Department of Energy
United States. Department of Energy. Office of Scientific and Technical Information
- One of the most important aspects in moving from the cell level to the integrated module level in thin-film photovoltaics is to achieve reliable and reproducible cell interconnects having low series resistance and high shunt resistance, and to do this with a minimum of dead area between cells. It is known that mechanical scribing often produces considerable damage (e.g., film tearing) surrounding the scribe. Laser scribing has shown the potential for superior scribe widths and profiles for many of the materials involved with thin-film PV. However, problems arc also known to occur with a heat-affected zone around the scribe, and for some materials and some focus conditions high positive ridges or collars are left along the scribe line. The commercially-available scribing systems have been optimized typically for other applications and other materials such as scribing of crystalline Si. Optimum operation for thin-film PV materials has been investigated by several PV manufacturers but there has been limited discussion of problems or of optimum parameters in the open literature. Furthermore, to our knowledge, there has been little investigation of the applicability, for thin-film PV, of laser systems other than the traditional cw lamp-pumped, Q-switched Nd:YAG.
- Published through SciTech Connect.
Compaan, A.D.; Matulionis, I.; Jayamaha, U.; Miller, M.J.
National Renewable Energy Lab., Golden, CO (United States)
- Funding Information:
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