Materials technology applied to nuclear accelerator targets [electronic resource].
- Los Alamos, N.M. : Los Alamos National Laboratory, 1986. and Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- Pages: 28 : digital, PDF file
- Additional Creators:
- Los Alamos National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
- The continuing requests for both shaped and flat, very low areal density metal foils have led to the development of metallurgical quality, high strength products. Intent of this paper is to show methods of forming structures on various substrates using periodic vapor interruptions, alternating anodes, and mechanical peening to alter otherwise unacceptable grain morphology which both lowers tensile strength and causes high stresses in thin films. The three technologies, physical vapor deposition, electrochemistry, and chemical vapor deposition and their thin film products can benefit from the use of laminate technology and control of grain structure morphology through the use of materials research and technology.
- Published through SciTech Connect., 11/10/1986., "la-ur-86-3111", " conf-861114-3", "DE87000138", 9. international conference on application of accelerators in research and industry, Denton, TX, USA, 10 Nov 1986., and Barthell, B.L.
- Funding Information:
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