Effects of varying oxygen partial pressre on molten silicon [electronic resource] : ceramic substrate interactions, final report
- Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 1980.
- Physical Description:
- Pages: 36 : digital, PDF file
- Additional Creators:
- United States. Department of Energy. Office of Scientific and Technical Information
- Restrictions on Access:
- Free-to-read Unrestricted online access
- The objective of the contract is to investigate the interaction of molten silicon with various die and container candidate materials under varying oxygen partial pressures. This has been done by making silicon sessile drop contact angle measurements on the candidate materials to determine the degree to which silicon wets these substances, and subsequently sectioning the post-sessile drop experiment samples and taking photomicrographs of the silicon-substrate interface to observe the degree of surface dissolution and degradation. Several different materials supplied by JPL have been investigated in this manner, i.e., hot pressed silicon nitride (from both Kawecki Berylco, Inc. (KBI) and AVCO), CNTD silicon nitride coated on hot pressed silicon nitride (Chemetal-Eagle Picher), CVD silicon carbide coated on graphite (Ultracarbon), and ..cap omega.. Sialon (Battelle). Results are described. The oxygen concentrations in the EFG silicon ribbon furnace at Mobil Tyco Solar Energy Corp., Waltham, Massachusetts, and in the JPL silicon sessile drop furnace at Pasadena, California, were measured using the portable thoria-yttria solid solution electrolyte oxygen sensor constructed at UMR for this purpose. Oxygen partial pressures of 10/sup -7/ and 10/sup -8/ atm. were obtained for the Mobil Tyco and JPL facilities, respectively.
- Published through SciTech Connect., 04/01/1980., "doe/jpl/955415-2", Barsoum, M.W.; Ownby, P.D.; Romero, H.V., and Missouri Univ., Rolla (USA). Dept. of Ceramic Engineering
- Funding Information:
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