Characterization of near surface regions in irradiated Ni(Si) alloys [electronic resource].
- Argonne, Ill. : Argonne National Laboratory, 1980. and Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- Pages: 17 : digital, PDF file
- Additional Creators:
- Argonne National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
- Restrictions on Access:
- Free-to-read Unrestricted online access
- Transmission electron microscopy (TEM), Rutherford backscattering spectrometry (RBS), Auger electron spectroscopy (AES), and infra-red pyrometry (IRP) have been used to characterize the growth of Ni/sub 3/Si films on the surfaces of irradiated Ni(Si) alloys. Results from each of the four techniques are presented and discussed, and comparisons are made between the different techniques. AES measurements are reported which suggest that Si concentrations significantly in excess of that found for stoichiometric Ni/sub 3/Si are induced in regions very near to the surface during irradiation.
- Published through SciTech Connect., 01/01/1980., "conf-800205-8", American Institute of Metallurgical Engineers meeting, Las Vegas, NV, USA, Feb 1980., and Rehn, L.E.; Okamoto, P.R.; Averback, R.S.
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