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Materials aspects of x-ray lithography : symposium held April 12-14, 1993, San Francisco, California, U.S.A. / editors, George K. Celler, Juan R. Maldonado

Published
Pittsburgh, Pa. : Materials Research Society, 1993.
Physical Description
xi, 291 pages : illustrations ; 24 cm.
Additional Creators
Celler, George K., Maldonado, Juan R., and Materials Research Society
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Contents
Machine generated contents note: Materials Research Society Symposium Proceedings -- Materials Issues in X-Ray Lithography / M. C. Peckerar / K. Foster / E. A. Dobisz / J. Kosokowski / W. Chu / K. Rhee / L. S. Shirey / C. R. K. Marrian / R. E. Salvino -- Materials and Image Formation in X-Ray Lithography / F. Cerrina / G. M. Wells -- Ionization Radiation Effects and Mechanisms / Yuli Vladimirsky / John D. Scott / Pradeep K. Bhattacharya -- X-Ray Lithography Induced Radiation Effects in Deep Submicron CMOS Devices / L. K. Wang / A. Acovic / W. H. Chang -- The Design and Performance Characteristics of X-Ray Sensitive Resists / Anthony E. Novembre -- Modelling Photoelectron Effects in X-Ray Lithography / L. E. Ocola / F. Cerrina -- Effects of Simulated X-Ray Lithography Exposures on Submicron-Channel MOSFETs / A. J. Lelis / T. R. Oldham -- Mask Technology for X-Ray Nanolithography / M. L. Schattenburg / J. Carter / W. Chu / R. C. Fleming / R. A. Ghanbari / M. Mondol / N. Polce / Henry I. Smith -- Materials and Fabrication Processes for Highly Accurate X-Ray Masks / Masatoshi Oda / Hideo Yoshihara -- Characterization of a Silicon Nitride Mask Membrane Process / G. M. Wells / M. Reilly / R. Nachman / F. Cerrina / M. A. El Khakani / M. Chaker -- Contactless Evaluation of the Stress in X-Ray Mask Wafers (SiN/Si) Using a Laser/Microwave Method / Masatoshi Oda / Akira Usami / Takahisa Nakai / Akira Ito / Masaya Ichimura / Takao Wada -- Polycrystalline Diamond Films for X-Ray Lithography / S. J. Whitehair / J. E. Yehoda / R. Fuentes / R. A. Roy / C. R. Guarnieri / J. J. Cuomo -- Realization of X-Ray Lithography Masks Based on Diamond Membranes / M. F. Ravet / A. Gicquel / E. Anger / Z. Z. Wang / Y. Chen / F. Rousseaux -- Diamond Membranes for X-Ray Lithography Masks / William Phillips / Miguel A. Moreno -- Multilayer Mirrors for X-Ray Lithography / Eberhard Spiller -- Top Layer Oxidation in Mo/Si Multilayer X-Ray Mirror / Khanh Nguyen / Eric Gullikson / James Underwood -- Development of Robust Multilayer Optics for Use in High Peak Power Radiation Environments / Brian J. MacGowan / S. Mrowka / T. W. Barbee, Jr. / L. B. Da Silva / D. C. Eder / J. A. Koch / J. A. Turner / J. H. Underwood -- Materials for Laser-Plasma X-Ray Source Targets Applicable to Lithography / M. Chaker / J. F. Pelletier / J. C. Kieffer -- Characterization of Capillary-Optic Materials for Use in X-Ray Lithography / C. M. Dozier / M. I. Bell / D. A. Newman / R. K. Freitag / D. B. Brown / H. B. Rosenstock -- Fast Dosimeter Film for Evaluation of X-Ray Lithography Sources / Juan R. Maldonado / Andrew Pomerene -- Photoemission Measurements of Photocathode Materials in the 115-400 [actual symbol not reproducible] Range / S. Grantham / M. C. Richardson / R. Watts / T. Lucatorto / C. Tarrio / F. Pollack -- Characterization of Boron Films Prepared by Chemical Vapor Deposition and Their Application in X-Ray Imaging / Fang Yuan / David D. Allred -- Properties of SiC Film as X-Ray Mask Membrane / Yoh-Ichi Yamaguchi / Norimichi Annaka / Tsutomu Shoki / Isao Ameniya / Hiroyuki Nagasawa / Hiroyuki Kosuga / Osamu Nagarekawa -- Characterization of SiC Films Deposited by Laser Ablation Technique for X-Ray Membranes / M. A. El Khakani / M. Chaker / S. Boily / A. Papadopoullos / Y. Huai / A. Jean -- LPCVD of Silicon Carbide Films from the Organosilanes Diethylsilane and Di-T-Butylsilane / Roland A. Levy / James M. Grow -- Multilayer Membranes for X-Ray Lithography / Alex R. Shimkunas / Philip E. Mauger / Lawrence P. Bourget -- Materials Issues in X-Ray Mask Repair by Focused Ion Beams / John MeIngailis -- Intra-Granular Microstructure and Stress in Sputtered Tungsten Thin Films / M. F. Ravet / K. F. Badawi / N. Durand / H. Lafontaine / V. Barnole / A. M. Haghiri-Gosnet -- Electrodeposited Gold: Real Time Stress and Structural Change at Room Temperature / R. E. Acosta / I. Babich / P. Blauner / A. Wagner -- In-Situ Stress Control During Sputter Deposition / R. R. Kola / G. L. Miller / G. K. Celler.
Subject(s)
ISBN
1558992022
Note
Papers based on the symposium on Materials Aspects of X-Ray Lithography, held in San Francisco, California, on April 12-14, 1993.
AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
Bibliography Note
Includes bibliographical references and indexes.
View MARC record | catkey: 14466879