Actions for Metal-organic chemical vapor deposition of electronic ceramics II : symposium held on November 27-29 1995, Boston, Massachusetts, U.S.A.

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Metal-organic chemical vapor deposition of electronic ceramics II : symposium held on November 27-29 1995, Boston, Massachusetts, U.S.A./ / editors, Seshu B. Desu, David B. Beach, Peter C. van Buskirk

Published
Pittsburgh, Pa. : Materials Research Society, [1996]
Copyright Date
©1996
Physical Description
xi, 264 pages : illustrations ; 18 cm.
Additional Creators
Beach, David B., Desu, Seshu B., and Van Buskirk, Peter C.
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Contents
Machine generated contents note: Materials Research Society Symposium Proceedings -- Growth via MOCVD and Characterization of GaN and Al [subscript x]Ga[subscript 1-x]N(0001)Alloys for Optoelectric and Microelectronic Device Applications / T. W. Weeks, Jr. / Robert F. Davis / M. D. Bremser / K. S. Ailey / W. G. Perry -- MOCVD of SrS and SrS:Ce Thin Films for Electroluminescent Flat Panel Displays / Christopher N. King / H. Le / J. Hitt / R. L. Thuemler / J. F. Wager / David C. Smith / Christian F. Schaus / Richard T. Tuenge / Kenny Salazar / Kerry N. Siebein / John A. Samuels -- MOCVD of the Blue Electro-Luminescent Phosphor CaGa[subscript 2]S[subscript 4]:Ce from a Liquid Reagent Delivery System / M. J. DelaRosa / C. F. Schaus / J. A. Samuels / D. C. Smith / R. C. Dye / T. S. Moss -- The Properties of GaInAsSb/GaSb Heterostructure Grown by MOCVD and p-GaInAsSb/n-GaSb Photodiodes / Yixin Jin / Baolin Zhang / Hong Jiang / Shuwei Li / Yongqiang Ning / Tianming Zhou -- MOCVD Growth of [actual symbol not reproducible] and Ga[subscript x]In[subscript 1-x]Sb Alloys: Effect of Parameters on their Solid Compositions / Shuwei Li / Yongqiang Ning / Hong Jiang / Baolin Zhang / Yixin Jin / Tianminng Zhou -- Silicon Nitride Tools Coated with TiC or TiN Composite Diamond Structures / J. Narayan / K. Jagannadham / W. D. Fan -- Characterization of Amorphous Carbon Films Based on Carbon, Nitrogen, and Hydrogen / H. Efstathiadis / Z. Akkerman / F. W. Smith -- Improvement of PECVD-SiNx for TFT Gate Insulator by Controlling Ion Bombardment Energy / Tadahiro Ohmi / Shoich Ono / Koich Fukuda / Hirobumi Fukui / Chisato Iwasaki / Yasuhiko Kasama -- MOCVD Routes to Thin Films for Superconducting Applications Precursor Synthesis and Film Processing Issues / T. J. Marks / J. A. Belot / B. J. Hinds / J. Chen / D. Studebaker / J. Lei / R. P. H. Chang / J. L. Schindler / C. R. Kannewurf -- From Proposal to Product: Scaling up the Chemical Synthesis of MOCVD Oxide Precursors / T. J. Leedham -- Group 13-16 Precursors: What Controls their Volatility? / Edward G. Gillan / Simon G. Bott / Andrew R. Barron -- Development of novel Nickel ([beta]-Diketonate)[subscript 2]-Ligand Complexes as Precursors for MOCVD of Nickel and Nickel Oxide / Carel I. M. A. Spee / Hans L. Linden / Adri Mackor / Klaas Timmer / Harry A. Meinema -- Barium bis ([beta]-Diketonate) [actual symbol not reproducible] tetraglyme Complexes as Potential CVD Precursors for Electronic Materials / Henry A. Luten III / David J. Otway / William S. Rees, Jr. -- An Investigation into the Role of Incorporated Solvent (EtOH/H[subscript 2]O) Molecules on the Structure of Group 2 Metal bis ([beta]-Diketonate) Complexes: Ramifications for CVD Precursors of Electronic Materials / David J. Otway / Henry A. Luten / K. M. Abdul Malik / Michael B. Hursthouse / William S. Rees, Jr. -- Erbium Tris(amide) Compounds as Source Molecules for Rate Earth Doping of Semiconducting Materials / Oliver Just / Anton C. Greenwald / William S. Rees, Jr. -- Zinc Bis(amide) Compounds Evaluated as Designed Precursors for Site-Selective P-type Doping of ZnSe / David A. Gaul / Oliver Just / William S. Rees, Jr. -- Liquid Delivery MOCVD of Ferroelectric PZT / J. F. Roeder / B. A. Vaartstra / P. C. Van Buskirk / H. R. Beratan -- Reproducible Growth of Highly Oriented (001) YSZ Films of Amorphous SiO[subscript 2] Substrates by MOCVD / G. Doubinina / G. T. Stauf -- Thermodynamic Analysis, A Useful Tool for MOCVD / C. Bernard / A. Pisch / F. Weiss / R. Madar -- MOCVD HTSC Precursor Delivery Monitored by UV Spectroscopy / Brian J. Rappoli / William J. DeSisto -- APCVD: In Situ Growing and Investigation of Electrochromic WO[subscript 3] Films / K. A. Gesheva / G. Stoyanov / D. Gogova -- A Study on the Thermal Decomposition of Ba(tmhd)[subscript 2] and Sr(tmhd)[subscript 2] / Hyun-Kyu Ryu / Jae Hyun Han / Sang Heup Moon -- Advanced Interactive Personal Computer-Based Process Control Systems for Oxide MOCVD Systems / G. S. Tompa / D. Shen / C. Zhang / I. H. Murzin / B. Gallois / S. Liang / C. R. Gorla / Y. Chen -- BaTiO[subscript 3] Thin Films for Electro-optic and Non-linear Optical Applications / B. A. Block / B. W. Wessels -- Preparation and Characterization of SrTiO[subscript 3] Thin Films Using ECR Plasma Assisted MOCVD / Joon Sung Lee / Han Wook Song / Dae Sung Yoon / Byung Hyuk Jun / Byoung Gon Yu / Zhong Tao Jiang / Won Jong Lee / Kwangsoo No -- The Microstructure and Properties of Layered Oxide Thin Films Fabricated by MOVCVD / Tingkai Li / Yongfei Zhu / Seshu B. Desu / Masaya Nagata -- Preparation and Properties of Ferroelectric [actual symbol not reproducible] Thin Films for FeRAM Using Flash-MOCVD / T. Ami / K. Hironaka / C. Isobe / N. Nagel / M. Sugiyama / Y. Ikeda / K. Watanabe / A. Machida / K. Miura / M. Tanaka -- The Microstructure of SrBi[subscript 2]Ta[subscript 2]O[subscript 9] Films / C. D. Gutleben / Y. Ikeda / C. Isobe / A. Machida / T. Ami / K. Hironaka / E. Morita -- High Temperature X-ray Diffraction Study of PbTiO[subscript 3] Thin Films Grown on MgO(001) by MOCVD / R. S. Batzer / Biming Yen / Donhang Liu / H. Kubo / G. R. Bai / Haydn Chen -- The Preparation and Characterization of Lithium Cobalt Oxide Thin Films LPCVD / L. T. Kenny / R. C. Breitkopf / T. E. Haas / R. B. Goldner -- Dielectric Behavior of CVD (Ba, Sr)TiO[subscript 3] Thin Films on Pt/Si / S. K. Streiffer / C. Basceri / A. I. Kingon / S. Lipa / S. Bilodeau / R. Carl / P. C. Van Buskirk -- MOCVD of Very Thin Films of Lead Lanthanum Titanate / David B. Beach / Catherine E. Vallet -- MOCVD of SnO[subscript 2] on Silicon Microhotplate Arrays for Use in Gas Sensing Applications / F. Dimeo, Jr. / S. Semancik / R. E. Cavicchi / J. S. Suehle / P. Chaparala / N. H. Tea -- Study of Microstructure and Gas Sensing Properties of Tin Oxide Thin Films Prepared by Metal Organic Chemical Vapor Deposition / Sang Woo Lee / Donhang Liu / Ping P. Tsai / Haydn Chen -- Room Temperature Deposition of High Dielectric Constant, High Density Ceramic Thin Films / K. Chen / M. Nielsen / S. Soss / S. Liu / E. J. Rymaszewski / T. M. Lu -- Chemical Vapor Deposition of Oxides from Alkoxides / R. Xu -- Liquid Source MOCVD of High Quality [actual symbol not reproducible] Films on Polycrystalline and Amorphous Substrates / D. B. Studebaker / G. Doubinina / J. Zhang / Y. Y. Wang / V. P. Dravid / T. J. Marks.
Subject(s)
ISBN
1558993185 (alk. paper)
Note
AVAILABLE ONLINE TO AUTHORIZED PSU USERS.
Bibliography Note
Includes bibliographical references and indexes.
View MARC record | catkey: 14466976