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Energy deposition in TATB by electrons at 50 and 100 MeV [electronic resource].

Published
Livermore, Calif. : Lawrence Livermore Laboratory, 1976.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
Pages: 13 : digital, PDF file
Additional Creators
Lawrence Livermore Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
Since energy deposition by electron beams is almost instantaneous, deposition profiles can be used to effectively calculate the impulse delivered by the electron energy deposition within a material. Electron deposition also produces thermal effects that can sensitize certain targets. These two factors, along with the fact that high explosives will thermally or shock initiate, leads to interest in the effects produced by impinging electron beams on high explosives. Results of calculations made for a 0.1 cm/sup 2/ electron beam source directed perpendicular to the high explosive surface are presented. The H.E. chosen in these calculations was TATB, a new shock insensitive explosive. Findings, however, are representative of what would be found in other high explosives had they been used. Two incident electron beam energies were chosen for this work, 50 and 100 MeV. Both electron sources were considered to be monoenergetic as input to the Monte Carlo electron/photon transport code SANDYL.
Report Numbers
E 1.99:ucid-17192
ucid-17192
Subject(s)
Other Subject(s)
Note
Published through SciTech Connect.
06/01/1976.
"ucid-17192"
Carson, J.K.
Funding Information
W-7405-ENG-48
View MARC record | catkey: 14657692