Very Large Scale Integration of Nano-Patterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array [electronic resource].
- Published:
- Berkeley, Calif. : Lawrence Berkeley National Laboratory, 2009.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy. - Physical Description:
- 5 : digital, PDF file
- Additional Creators:
- Lawrence Berkeley National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
Access Online
- Restrictions on Access:
- Free-to-read Unrestricted online access
- Summary:
- Very large scale integration of Josephson junctions in a two-dimensional series-parallel array has been achieved by ion irradiating a YBa₂Cu₃O{sub 7-δ} film through slits in a nano-fabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15,820 high-aspect ratio (20:1), 35-nm wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I{sub ck} we found a standard deviation in I{sub ck} of about 16%.
- Report Numbers:
- E 1.99:lbnl-2684e
lbnl-2684e - Other Subject(s):
- Note:
- Published through SciTech Connect.
09/01/2009.
"lbnl-2684e"
Nano Letters FT
Clarke, John; Wu, Stephen; Dynes, Robert; Cybart, Shane A; Anton, Steven.
Materials Sciences Division - Funding Information:
- DE-AC02-05CH11231
View MARC record | catkey: 14658120