EUV Binary Phase Gratings [electronic resource] : Fabrication and Application toDiffractive Optics

Published:: Washington, D.C. : United States. Dept. of Energy, 2005.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Additional Creators:: United States. Department of Energy and United States. Department of Energy. Office of Scientific and Technical Information

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Summary:

Diffractive optics play an important role in a variety of fields such as astronomy, microscopy, and lithography. For the extreme ultraviolet (EUV) region of the spectrum they have been difficult to make due to the extremely precise control required of their surface structure. We have developed a robust fabrication technique that achieves the required topographic control through the deposition of a thin film of Si on a Cr etch stop. We have fabricated binary phase gratings using this approach that have an efficiency of 80% of the theoretical maximum. The technique is applicable to any type of binary phase optical element.

Report Numbers:

E 1.99:lbnl--56785-journal
lbnl--56785-journal

Subject(s):

Other Instrumentation

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Note:

Published through SciTech Connect.
02/01/2005.
"lbnl--56785-journal"
": 600301020"
Journal of Vacuum Science and Technology 24 4 FT
Liddle, J.A.; Naulleau, P.P.; Gullikson, E.M.; Olynick, D.L.; Salmassi, F.
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)

Funding Information:

DE-AC02-05CH11231
M50044

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