Sputter deposition system for controlled fabrication of multilayers [electronic resource].
- Upton, N.Y. : Brookhaven National Laboratory, 1985.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- Pages: 7 : digital, PDF file
- Additional Creators:
- Brookhaven National Laboratory
United States. Department of Energy. Office of Scientific and Technical Information
- A detailed description of a sputter deposition system constructed specifically for the fabrication of x-ray and neutron multilayer monochromators and supermirrors is given. One of the principal design criteria is to maintain precise control of film thickness and uniformity over large substrate areas. Regulation of critical system parameters is fully automated so that response to feedback control information is rapid and complicated layer thickness sequences can be deposited accurately and efficiently. The use of either dc or rf magnetron sources makes it possible to satisfy the diverse material requirements of both x-ray and neutron optics.
- Published through SciTech Connect.
SPIE international technical symposium on optical and electro-optical engineers, San Diego, CA, USA, 18 Aug 1985.
Takacs, P.Z.; Majkrzak, C.F.; Stefan, P.M.; Di Nardo, R.P.
- Funding Information:
View MARC record | catkey: 14675020