Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source [electronic resource].
- Washington, D.C. : United States. Dept. of Energy, 1993. and Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- 21 pages : digital, PDF file
- Additional Creators:
- United States. Department of Energy and United States. Department of Energy. Office of Scientific and Technical Information
- Restrictions on Access:
- Free-to-read Unrestricted online access
- A versatile, high-intensity, negative ion source has been designed and is now under construction which can be operated in either the cesium-sputter or plasma-sputter mode. The cesium-sputter mode can be effected by installation of a newly designed conical-geometry cesium-surface ionizer; for operation in the plasma-sputter mode, the surface ionizer is removed and either a hot-filament or RIF antenna plasma-discharge igniter is installed. A multicusp magnetic field is specifically provided confining the plasma in the radial direction when the plasma-sputter mode is selected. This arrangement allows comparison of the two modes of operation. Brief descriptions of the design features, ion optics, and anticipated performances of the two source geometries will be presented in this report.
- Published through SciTech Connect., 12/31/1993., "conf-9308136--8", "DE96010633", 5. international conference on ion sources, Beijing (China), 31 Aug - 4 Sep 1993., Alton, G.D.; Mills, G.D.; Dellwo, J., and Oesterreichische Studiengesellschaft fuer Atomenergie GmbH, Vienna (Austria)
- Funding Information:
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