The H sup + ECR source for the LAMPF Optically Pumped Polarized Ion Source [electronic resource].
Published
Washington, D.C : United States. Dept. of Energy. Office of Energy Research, 1990. Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
An ECR source is used to produce the H⁺ beam for the Optically Pumped Polarized Ion Source (OPPIS) at LAMPF. OPPIS requires a very high H⁺ beam brightness from the ECR source. Studies of ECR extraction geometries that best fulfill this requirement are presented. 8 refs., 4 figs., 1 tab.
Report Numbers
E 1.99:la-ur-90-4156 E 1.99: conf-9011136--3 conf-9011136--3 la-ur-90-4156
Published through SciTech Connect. 01/01/1990. "la-ur-90-4156" " conf-9011136--3" "DE91005899" 10. international workshop on ECR ion sources, Knoxville, TN (USA), 1-2 Nov 1990. York, R.L.; Tupa, D.