Novel characteristics of VUV insertion device beamlines at the Advanced Light Source [electronic resource].
- Published
- Washington, D.C. : United States. Dept. of Energy, 1991.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy. - Physical Description
- Pages: (17 pages) : digital, PDF file
- Additional Creators
- Lawrence Berkeley National Laboratory, United States. Department of Energy, and United States. Department of Energy. Office of Scientific and Technical Information
Access Online
- Restrictions on Access
- Free-to-read Unrestricted online access
- Summary
- The design of VUV beamlines for the Advanced Light Source is discussed. Features of the design serve to illustrate the careful attention required in order to preserve the performance of the low emittance third generation'' storage ring, operating with insertion devices. 11 refs.
- Report Numbers
- E 1.99:lbl-31533
E 1.99: conf-9110146--20
conf-9110146--20
lbl-31533 - Subject(s)
- Other Subject(s)
- Note
- Published through SciTech Connect.
10/01/1991.
"lbl-31533"
" conf-9110146--20"
"DE92016923"
7. national conference and exhibition on synchrotron radiation instrumentation, Baton Rouge, LA (United States), 28-31 Oct 1991.
Warwick, T.; Heimann, P. - Funding Information
- AC03-76SF00098
View MARC record | catkey: 14697672