Actions for Microstructural characterization of external and internal oxide products on V-4Cr-4Ti [electronic resource].

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Microstructural characterization of external and internal oxide products on V-4Cr-4Ti [electronic resource].

Published
Oak Ridge, Tenn. : Oak Ridge National Laboratory, 1998.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
pages 77-81 : digital, PDF file
Additional Creators
Oak Ridge National Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
Air oxidation of V-4Cr-4Ti at 500 C at 1 atm resulted in the formation of a thin (100--150 nm) external vanadium nitride layer which was identified beneath a thicker (1.5 {micro}m) vanadium oxide scale. This nitride layer would only be detected by high-resolution, analytical electron microscopy techniques. Subsequent tests comparing room temperature tensile properties for exposure in laboratory air, dry air and dry oxygen at 1 atm showed more embrittlement in air than in O₂. Internal oxidation of coarse-grained V-4Cr-4Ti at low oxygen pressures at 500 C was followed by TEM examination. In a sample with a 1400 ppmw O addition, which is sufficient to reduce the ductility to near zero, there appeared to be an oxygen denuded zone (150--250 nm) near the grain boundaries with precipitates at the grain boundaries and uniform ultra-fine (<5 nm) oxygen particles in the matrix. In a similar O-loaded specimen that was subsequently annealed for 4h at 950 C to restore ductility, large oxide particles were observed in the matrix and at the grain boundaries.
Report Numbers
E 1.99:doe/er--0313/24
doe/er--0313/24
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Note
Published through SciTech Connect.
09/01/1998.
"doe/er--0313/24"
"DE98007433"
DiStefano, J.R.; DeVan, J.H.; Rice, P.M.; Pint, B.A.; Chitwood, L.D.
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