High intensity beam profile monitors for the LAMPF primary beam lines [electronic resource].
- Los Alamos, N.M. : Los Alamos Scientific Laboratory, 1979.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
- Physical Description:
- Pages: 4 : digital, PDF file
- Additional Creators:
- Los Alamos Scientific Laboratory
United States. Department of Energy. Office of Scientific and Technical Information
- Two types of beam profile monitors are in use at LAMPF to measure the properties of the 800 MeV, 500 ..mu..A proton beam external to the linac. Both types use secondary electron emission from a wire to produce a current signal proportional to the amount of proton beam that intercepts the wire. The wire scanner system uses a pair of orthogonal wires which are passed through the beam and the harp system uses two fixed planes of parallel wires. Most of the harps are not retractable and are exposed continuously to the primary beam. The high beam intensities available lead to a number of technical problems for instruments that intercept the beam or are close to primary beam targets. The thermal, electrical, radiation-damage, and material selection problems encountered, and some solutions which have been implemented are discussed.
- Published through SciTech Connect.
IEEE particle accelerator conference, San Francisco, CA, USA, 12 Mar 1979.
Lee, D.; Hoffman, E.W.; Harvey, A.; Macek, R.J.; van Dyck, O.; Bridge, J.; Cainet, J.
- Funding Information:
View MARC record | catkey: 14754846