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Ultraviolet damage resistance of laser coatings [electronic resource].

Published
Los Alamos, N.M. : Los Alamos Scientific Laboratory, 1978.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Physical Description
Pages: 19 : digital, PDF file
Additional Creators
Los Alamos Scientific Laboratory and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
The damage resistance of several thin-film materials used in ultraviolet laser optics was measured at 266 and 355 nm. The coatings included single, quarterwave (QW) layers of NaF, LaF/sub 3/, MgF/sub 2/, ThO/sub 2/, Al/sub 2/O/sub 3/, HfO/sub 2/, ZrO/sub 2/, Y/sub 2/O/sub 3/ and SiO/sub 2/, plus multilayer reflectors composed of some of these materials. The substrates were uv-grade fused silica. Single-shot thresholds were obtained with 22 ns and 27 ns (FWHM) pulses at 266 and 355 nm, respectively. One of the samples had previously been tested using 20-ps pulses, providing a pulsewidth comparison. At 266 nm the coating with the highest damage threshold was a QW layer of NaF at 10.8 J/cm/sup 2/ (450 MW/cm/sup 2/), whereas for a maximum reflector of Al/sub 2/O/sub 3//NaF the value was 3.6 J/cm/sup 2/ (154 MW/cm/sup 2/), and the threshold of the maximum reflector was 12.2 J/cm/sup 2/ (470 MW/cm/sup 2/). The results were analyzed to determine correlations with standing-wave electric fields and linear and two-photon absorption. Scaling relationships for wavelength, refractive index and atomic density, and pulsewidth were found.
Report Numbers
E 1.99:la-ur-78-2607
E 1.99: conf-780982-1
conf-780982-1
la-ur-78-2607
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Other Subject(s)
Note
Published through SciTech Connect.
01/01/1978.
"la-ur-78-2607"
" conf-780982-1"
10. symposium on laser induced damage materials, Boulder, CO, USA, 12 Sep 1978.
Gill, D.H.; Newnam, B.E.
Funding Information
W-7405-ENG-36
View MARC record | catkey: 14756465