1999 4th International Symposium on Plasma Process-Induced Damage [electronic resource] : May 9-11, 1999, Monterey, California, USA / Thuy Dao, Mitsumasa Koyanagi, and Terence Hook, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics

Conference Author: International Symposium on Plasma Process-Induced Damage (4th : 1999 : Monterey, Calif.)
Additional Titles: 4th International Symposium on Plasma Process-Induced Damage and Fourth International Symposium on Plasma Process-Induced Damage
Published: Sunnyvale, CA : Northern California Chapter of the American Vacuum Society, c1999.
Physical Description: 211 p. : ill. ; 28 cm.
Additional Creators: Dao, Leanne Thuy Lien, 1958-, Koyanagi, Mitsumasa, Hook, Terence, IEEE Electron Devices Society, American Vacuum Society, and Ōyō Butsuri Gakkai