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Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources [electronic resource].

Published
Albuquerque, N.M. : Sandia Corporation, 2000.
Oak Ridge, Tenn. : Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy.
Additional Creators
Sandia Corporation and United States. Department of Energy. Office of Scientific and Technical Information
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Summary
A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.
Report Numbers
E 1.99:us 6011267
us 6011267
Other Subject(s)
Note
Published through SciTech Connect.
01/04/2000.
"us 6011267"
"US patent application 09/032,224"
Kubiak, Glenn D.; Bernardez, II, Luis J.
Funding Information
AC04 -94DP85000
View MARC record | catkey: 14987776