Actions for Effects on LDEF exposed copper film and bulk

Email RIS file
Bookmark
Report an Issue

Effects on LDEF exposed copper film and bulk

Author
Christl, Ligia C.
Published
Aug 31, 1991.
Physical Description
1 electronic document
Additional Creators
Gregory, John C., Raikar, Ganesh N., and Peters, Palmer N.
Online Version

Availability

I Want It
I Want It

Finding items...

Restrictions on Access
Unclassified, Unlimited, Publicly available.
Free-to-read Unrestricted online access
Summary
Two forms of copper were exposed to the Long Duration Exposure Facility (LDEF) Mission 1 environment: a copper film, initially 74.2 plus or minus 1.1 nm thick sputter coated on a fused silica flat and a bulk piece of oxygen-free, high conductivity (OFHC) copper. The optical density of the copper film changed from 1.33 to 0.70 where exposed, and the film thickness increased to 106.7 plus or minus 0.5 nm where exposed. The exposed area appears purple by reflection and green by transmission for the thin film and maroon color for the bulk copper piece. The exposed areas increased in thickness, but only increase in the thickness of the thin film sample could be readily measured. The increase in film thickness is consistent with the density changes occurring during conversion of copper to an oxide. However, we have not been able to confirm appreciable conversion to an oxide by x-ray diffraction studies. We have not yet subjected the sample to e-beams or more abusive investigations out of concern that the film might be modified.
Other Subject(s)
Collection
NASA Technical Reports Server (NTRS) Collection.
Note
Document ID: 19920001858.
Accession ID: 92N11076.
Analysis of Surfaces from the LDEF A0114, Phase 4; 8 p.
Terms of Use and Reproduction
No Copyright.
View MARC record | catkey: 15678732