Dry etch technology : 9-10 September 1991, San Jose, California / Deepak Ranadive, chair ; sponsored by SPIE--The International Society for Optical Engineering
- Bellingham, Wash., USA : SPIE, 1992.
- Physical Description:
- viii, 222 pages : illustrations ; 28 cm.
- Additional Creators:
- Ranadive, Deepak
Society of Photo-optical Instrumentation Engineers
Symposium on Microelectronic Processing Integration (1991 : San Jose, Calif.)
Full Text available online
By special arrangement in response to the COVID-19 pandemic, patrons may access this resource online through the HathiTrust Emergency Temporary Access Service.
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 1593
- "Part of a two-conference program on Microelectronic Manufacturing Science and Technology held at SPIE's 1991 Symposium on Microelectronic Processing Integration, 9-13 September 1991, in San Jose, California"--P. v.
- Bibliography Note:
- Includes bibliographical references and index.
View MARC record | catkey: 1627975