Molecular theory of lithography / by Uzodinma Okoroanyanwu
- Author
- Okoroanyanwu, Uzodinma
- Published
- Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2015.
- Physical Description
- 1 online resource (xix, 469 pages).
- Additional Creators
- Society of Photo-Optical Instrumentation Engineers
Access Online
- Restrictions on Access
- Restricted to subscribers or individual electronic text purchasers.
- Contents
- Preface -- Acronyms and abbreviations -- 1. Overview of lithography -- 2. Theory of the lithographic process -- 3. Theory of molecular interactions in lithography -- 4. Theory of photochemical and radiochemical lithographic imaging mechanisms -- 5. Theory of block copolymer self-assembly lithographic imaging mechanisms -- 6. Theory of imprint lithographic imaging mechanisms -- Index.
- Summary
- This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics.
- Subject(s)
- Genre(s)
- ISBN
- 9781628415520 electronic
9781628415513 - Note
- "SPIE Press monograph" -- PM255.
"SPIE Digital Library."--Website.
AVAILABLE ONLINE TO AUTHORIZED PSU USERS. - Bibliography Note
- Includes bibliographical references and index.
- Other Forms
- Also available in print version.
- Technical Details
- Mode of access: World Wide Web.
System requirements: Adobe Acrobat Reader.
View MARC record | catkey: 16636860