Monolithic integrated high-T.sub.c superconductor-semiconductor structure
- Author
- Russell, Stephen D.
- Published
- April 18, 2000.
- Physical Description
- 1 electronic document
- Additional Creators
- Burns, Michael J., de la Houssaye, Paul R., Garcia, Graham A., Clayton, Stanley R., and Barfknecht, Andrew T.
Online Version
- hdl.handle.net , Connect to this object online.
- Restrictions on Access
- Unclassified, Unlimited, Publicly available.
Free-to-read Unrestricted online access - Summary
- A method for the fabrication of active semiconductor and high-temperature superconducting device of the same substrate to form a monolithically integrated semiconductor-superconductor (MISS) structure is disclosed. A common insulating substrate, preferably sapphire or yttria-stabilized zirconia, is used for deposition of semiconductor and high-temperature superconductor substructures. Both substructures are capable of operation at a common temperature of at least 77 K. The separate semiconductor and superconductive regions may be electrically interconnected by normal metals, refractory metal silicides, or superconductors. Circuits and devices formed in the resulting MISS structures display operating characteristics which are equivalent to those of circuits and devices prepared on separate substrates.
- Other Subject(s)
- Collection
- NASA Technical Reports Server (NTRS) Collection.
- Note
- Document ID: 20080006927.
- Terms of Use and Reproduction
- No Copyright.
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