- Restrictions on Access:
- Unclassified, Unlimited, Publicly available.
- Amorphous Co:Si (1:2 ratio) films are electron gun-evaporated on clean Si(111), such as in a molecular beam epitaxy system. These layers are then crystallized selectively with a focused electron beam to form very small crystalline Co/Si2 regions in an amorphous matrix. Finally, the amorphous regions are etched away selectively using plasma or chemical techniques.
- NASA Technical Reports Server (NTRS) Collection.
- Document ID: 19920009319.
Accession ID: 92N18561.
- No Copyright.
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